Claim · model-written summary
Higher nitrogen ion influence followed a damage-repair-damage trend.
- Taxon
- Glycyrrhiza uralensis
Glycyrrhiza uralensist0 - Outcome
- damage-repair-damage modele0
Not reportedMaterialGeneCompoundOrgan / stageInteractorInteractor roleSecond interactorSecond interactor roleTreatmentComparatorSettingDirectionValueQualifier
Organisms pictured · Representative pictures of the matched species, not figures from the paper.
Verbatim
e0“N~+ of higher influence showed a trend of damage-repair-damage model.”
t0“Effects of nitrogen ion implantation on seed germination and root development in Glycyrrhiza uralensis and possible mechanism”
Title
Wei Shenglin; Liu Jing-nan 2004
Other claims from this paper (5)
- Intervention effect Low-dose nitrogen ion implantation stimulated Glycyrrhiza seed germination.
- Intervention effect Low-dose nitrogen ion implantation stimulated root development.
- Mechanism Authors suggest dynamic free-radical elimination during implantation.
- Recommendation Authors identify 25 keV, 4.68×10~(16) /cm~2 implantation as an appropriate mutagen for survival, germination, root development, and drought tolerance.
- Recommendation Authors recommend implanted seeds for desert revegetation.