Claim · model-written summary
Suppressing the chloroplast avoidance response caused oxidative stress under excess light at low temperature.
- Taxon
- Arabidopsis
Arabidopsist0 - Treatment
- Suppression of avoidance responsee1
- Outcome
- oxidative stresse1
- Qualifier
- under excess light at low temperaturee1
Not reportedMaterialGeneCompoundOrgan / stageInteractorInteractor roleSecond interactorSecond interactor roleComparatorSettingDirectionValue
Organisms pictured · Representative pictures of the matched species, not figures from the paper.
Verbatim
e1“Suppression of avoidance response resulted in oxidative stress under excess light at low temperature, while removing either zeaxanthin or PsbS had a milder effect”
t0“Arabidopsis”
Title
Stefano Cazzaniga; Luca Dall' Osto; Sam‐Geun Kong; et al. The Plant Journal 2013. doi:10.1111/tpj.12314
Other claims from this paper (7)
- Intervention effect Removing zeaxanthin or PsbS had a milder effect on oxidative stress than suppressing the avoidance response.
- Association The phot2 npq1 and phot2 npq4 double mutants showed the highest sensitivity to photooxidative stress.
- Mechanism The xanthophyll cycle and qE have additive effects over the chloroplast avoidance response against photooxidative stress.
- Observation The phot2 mutant fluorescence decay lacks a component, named qM.
- Association The qM component correlates linearly with leaf transmittance changes from chloroplast relocation under white light and is absent under red light.
- Mechanism A decrease in leaf optical density affects the apparent NPQ rise kinetic.
- Mechanism Excess light-induced fluorescence decrease is partly due to avoidance of photon absorption rather than genuine quenching.