Claim · model-written summary
Al at 100 μmol L-1 reduced shoot and root dry weight of wheat seedlings compared with controls.
- Taxon
- Triticum aestivum L.
Triticum aestivume0 - Material
- cv. Celtice0
- Treatment
- 100 μmol L −1 Ale2
- Outcome
- shoot (S) and root (R) dry weighte2
- Direction
- reducede2
- Comparator
- controlse2
Not reportedGeneCompoundOrgan / stageInteractorInteractor roleSecond interactorSecond interactor roleSettingValueQualifier
Organisms pictured · Representative pictures of the matched species, not figures from the paper.
Verbatim
e0“Seedlings of Triticum aestivum L. (cv. Celtic)”
e2“Both the shoot (S) and root (R) dry weight of seedlings treated with 100 μmol L −1 Al were reduced when compared with controls”
Title
INTERACTION BETWEEN SILICON AND ALUMINUM IN TRITICUM AESTIVUM L. (CV. CELTIC)
Kay M. Cocker; Martin J. Hodson; David E. Evans; et al. Israel Journal of Plant Sciences 1997. doi:10.1080/07929978.1997.10676691
Other claims from this paper (15)
- Intervention effect Al at 100 μmol L-1 inhibited root length of wheat seedlings at pH 4.2 and 4.6.
- Intervention effect Al treatment increased shoot-to-root ratios of wheat seedlings.
- Intervention effect Si ameliorated the Al-induced increase in S:R ratios, but only at pH 4.6.
- Intervention effect Al at 100 μmol L-1 increased root Al content significantly relative to controls.
- Intervention effect Al at 100 μmol L-1 combined with Si at 2000 μmol L-1 increased root Al content significantly relative to controls.
- Intervention effect Root Al accumulation was higher with 100 μmol L-1 Al plus 2000 μmol L-1 Si than with 100 μmol L-1 Al alone.
- Intervention effect Al treatment reduced root and shoot K concentrations under both pH regimes.
- Intervention effect Si did not ameliorate the Al-induced reduction in K concentrations.
- Intervention effect Al treatment had little effect on seedling Ca levels.
- Observation With 2800 μmol L-1 Si, the major silica deposition sites in wheat roots were the endodermal walls.
- Observation With 75 μmol L-1 Al, Al was mainly located in the epidermal and hypodermal walls of wheat roots.
- Intervention effect Al treatment caused phosphorus leakage into root cell walls.
- Observation With both 2800 μmol L-1 Si and 75 μmol L-1 Al present, only Si was deposited in the endodermal walls.
- Observation With both 2800 μmol L-1 Si and 75 μmol L-1 Al present, both elements were present in the epidermal walls.
- Intervention effect Leakage of phosphorus appeared to be prevented in the presence of Si.