Claim · model-written summary
Al at 100 μmol L-1 combined with Si at 2000 μmol L-1 increased root Al content significantly relative to controls.
- Taxon
- Triticum aestivum L.
Triticum aestivume0 - Treatment
- 100 μmol L −1 Al/2000 μmol L −1 Sie5
- Outcome
- Al content of rootse5
- Direction
- increasede5
- Comparator
- controlse5
Not reportedMaterialGeneCompoundOrgan / stageInteractorInteractor roleSecond interactorSecond interactor roleSettingValueQualifier
Organisms pictured · Representative pictures of the matched species, not figures from the paper.
Verbatim
e0“Seedlings of Triticum aestivum L. (cv. Celtic)”
e5“Al content of roots treated with 100 μmol L −1 Al or 100 μmol L −1 Al/2000 μmol L −1 Si increased significantly when compared with controls”
Title
INTERACTION BETWEEN SILICON AND ALUMINUM IN TRITICUM AESTIVUM L. (CV. CELTIC)
Kay M. Cocker; Martin J. Hodson; David E. Evans; et al. Israel Journal of Plant Sciences 1997. doi:10.1080/07929978.1997.10676691
Other claims from this paper (15)
- Intervention effect Al at 100 μmol L-1 inhibited root length of wheat seedlings at pH 4.2 and 4.6.
- Intervention effect Al at 100 μmol L-1 reduced shoot and root dry weight of wheat seedlings compared with controls.
- Intervention effect Al treatment increased shoot-to-root ratios of wheat seedlings.
- Intervention effect Si ameliorated the Al-induced increase in S:R ratios, but only at pH 4.6.
- Intervention effect Al at 100 μmol L-1 increased root Al content significantly relative to controls.
- Intervention effect Root Al accumulation was higher with 100 μmol L-1 Al plus 2000 μmol L-1 Si than with 100 μmol L-1 Al alone.
- Intervention effect Al treatment reduced root and shoot K concentrations under both pH regimes.
- Intervention effect Si did not ameliorate the Al-induced reduction in K concentrations.
- Intervention effect Al treatment had little effect on seedling Ca levels.
- Observation With 2800 μmol L-1 Si, the major silica deposition sites in wheat roots were the endodermal walls.
- Observation With 75 μmol L-1 Al, Al was mainly located in the epidermal and hypodermal walls of wheat roots.
- Intervention effect Al treatment caused phosphorus leakage into root cell walls.
- Observation With both 2800 μmol L-1 Si and 75 μmol L-1 Al present, only Si was deposited in the endodermal walls.
- Observation With both 2800 μmol L-1 Si and 75 μmol L-1 Al present, both elements were present in the epidermal walls.
- Intervention effect Leakage of phosphorus appeared to be prevented in the presence of Si.